| Authors: | Y.X. Zhuang, L.H. Frandsen, A. Harpøth, M. Thorhauge, M. Kristensen, P.I. Borel, W. Bogaerts, R. Baets | | Title: | Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography | | Format: | International Conference Proceedings | | Publication date: | 2/2004 | | Journal/Conference/Book: | OFC 2004
| | Volume(Issue): | p.ThR2 | | Location: | Los Angeles, United States | | Citations: | Look up on Google Scholar
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Abstract
Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations Related Research Topics
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